Australian and New Zealand agents for Evactron® Plasma cleaners from XEI Scientific
Evactron® Plasma Cleaners can make significant improvements to image quality and image resolution an Electron microscope.
The Evactron® plasma cleaners work by generating a plasma at a Plasma Radical source (PRS) allowing Oxygen radicals to flow through a ch
amber and removing any unwanted hydrocarbon contamination. The radicals chemically react with the hydrocarbons C02 and H20 which are then pumped out of the system.
Evactron® plasma cleaners are available for mounting directly on the electron microscope column or as a standalone desktop system.
For more information on Evactron® plasma cleaners, or to request a quote, please Contact Us.
Product information: Applications of Plasma Techology in Microscopy
The Evactron® E16 De-Contaminator is a compact yet simplified plasma cleaner for Electron and Ion Beam Instrument load locks such as SEMs, TEMs, FIBs, and sample preparation chambers. The E16 delivers gentle and effective cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination.
New design features of the Evactron® E16 Plasma Radical Source (PRS) include a unique flush-mounting flange and compact size to fit in restricted spaces on a chamber wall. The Evactron® E16 Power Centre controller has a small footprint and can be placed horizontally or vertically to conserve space.
EVACTRON E50 E-TC
- RF Power: 75W peak, 50W continuous
- Dual action cleaning using plasma and UV afterglow
- Energy efficient radio frequency hollow cathode plasma (RFHC)
- “POP” ignition at high vacuum
- Tethered touchpad communication package
- Remote hollow cathode plasma radical source
- Desktop controller with pushbutton operation
- Tethered touchpad communication
- Library of tested recipes and options to change power, cycles, length of cleaning, etc.
- Chassis dimensions WxHxD: 17”x3.4”x6.7” (43×8.6x17cm)
- RF Power: 35 – 75 Watts at 13.56 MHz RFHC
- 100-240 VAC 50/60 HZ input
- RoHS, CE, NRTL, TUV and SEMI S2 compliant
The microprocessor based Evactron® E25 monitors plasma operation, has internal memory and is factory programmed to allow minimum operator training. The tabletop Evactron® E25 Controller uses a microprocessor with embedded software to regulate a leak valve and control the chamber pressure by a MicroPirani™ gauge. The microprocessor also regulates the RF power and has a clock to time the downstream plasma cleaning and nitrogen purging cycles. The microprocessor also records the operational and fault log. The Encoder Knob sets parameters in menus shown on the front panel display, and the Enable/Disable Button readies the Evactron® E25 for downstream plasma cleaning. The RS232 interface communicates operating parameters, forward and reflected RF power, vacuum level read outs, and operation/fault log between the Evactron® E25 and a remote computer through the provided Graphical User Interface (GUI).
Download Product Specification here
EVACTRON ZEPHYR™ MODEL 25 PLASMA CLEANER
- Desktop controller
- SEM/FIB chambers or load locks
- 2 operating regimes
- classic mode (roughing pressures)
- T-pump mode (turbomolecular pressures)
- Cleans SEM/TEM samples
- Cleans TEM grids/sample rods
- Inert sample storage
SOFTCLEAN EP
- Android tablet with Bluetooth communication
- Optional Safar side loaders (US 8,716,676 B2)
- Accommodates up to three TEM stage rods
UHV VACUUM CHAMBER CLEANING SYSTEM
The Evactron U50 De-Contaminator is a compact, high performance yet simplified plasma cleaner for instruments and chambers designed to operate at UHV conditions. The U50 delivers high power cleaning for removal of hydrocarbon contamination on chamber and sample surfaces.
The compact design of the Evactron U50 Plasma Radical Source (PRS) makes it a versatile solution for either instrument chambers, load locks, or sample prep chambers. The Evactron U50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling hydrocarbon-free RGA spectra and fast pumpdown time to UHV.
SYSTEM FEATURES
- RF Power: 75W peak, up to 50W continuous
- Dual action cleaning using plasma and UV afterglow
- Energy efficient radio frequency hollow cathode plasma (RFHC)
- Conflat 2.75 flange for UHV compatibility
- Programmable power, cleaning time, number of cycles, recipes
- Tethered touchpad command communications module
- Wide range pressure operation: 0.3 Pa/ 2 mTorr to 80 Pa/ 600 mTorr
- Bakeable to 150⁰C
- TMP compatible, no advance venting needed
- Fast cleaning, 100X+ faster than earlier generation Evactron models
- Non-damaging to sensitive components – no sputter etch
- Leak tested to <10-11 Torr or 10-11 mBar (1.3E-9 Pa)
- Push button cleaning operation
- No match or gas flow adjustments needed for plasma ignition
- TUV, NRTL, SEMI, CE and RoHS compliant
EVACTRON U50 SYSTEM SPECIFICATIONS:
- Evactron U50 plasma radical source
- Desktop controller with pushbutton operation
- Tethered touchpad communication package
- Hardware interlock
- Chassis dimensions: W×H×D: 17.2”×3.5”×8.6”
(44×8.9×22 cm) - RF Power: 35 – 75 Watts at 13.56 MHz RFHC
- 100-240 VAC 50/60 Hz input
- RoHS Compliant
